Specific Process Knowledge/Thin film deposition/ALD Picosun R200: Difference between revisions
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*Al<sub>2</sub>O<sub>3</sub>: 0 - 100 nm | *Al<sub>2</sub>O<sub>3</sub>: 0 - 100 nm | ||
*TiO<sub>2</sub>: 0 - 100 nm | *TiO<sub>2</sub>: 0 - 100 nm | ||
*HfO<sub>2</sub>: 0 - 50 nm | *HfO<sub>2</sub>: 0 - 50 nm | ||
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*Amorphous TiO<sub>2</sub>: 100 - 150 <sup>o</sup>C | *Amorphous TiO<sub>2</sub>: 100 - 150 <sup>o</sup>C | ||
*Anatase TiO<sub>2</sub>: 300 - 350 <sup>o</sup>C | *Anatase TiO<sub>2</sub>: 300 - 350 <sup>o</sup>C | ||
*HfO<sub>2</sub>: 150 - 350 <sup>o</sup>C | *HfO<sub>2</sub>: 150 - 350 <sup>o</sup>C | ||
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|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*TMA | *TMA | ||
*TiCl<sub>4</sub> | *TiCl<sub>4</sub> | ||
*H<sub>2</sub>O | *H<sub>2</sub>O | ||