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Specific Process Knowledge/Characterization/XRD/Process Info: Difference between revisions

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Eves (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
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Eves (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,346 edits
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<gallery caption="XPS recordings. 10 nm SiC deposited on Si wafer" widths="700px" heights="300px" perrow="1">
<gallery caption="XPS recordings. 10 nm SiC deposited on Si wafer" widths="500px" heights="300px" perrow="1">
image:eves_omega_scan_concept_20230131.png|<b>C 1s</b> signal.
image:eves_omega_scan_concept_20230131.png|<b>C 1s</b> signal.
</gallery>
</gallery>
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