Specific Process Knowledge/Thermal Process/RTP Annealsys: Difference between revisions
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=RTP Annealsys - Rapid Thermal Processor= | =RTP Annealsys - Rapid Thermal Processor= | ||
''This page is written by Inês Diogo@DTU Nanolab if nothing else is stated.'' | ''This page is written by Inês Diogo@DTU Nanolab if nothing else is stated.'' | ||
''January 2023: The RTP Annealsys is being tested, but it is not released for general use yet. Please contact thinfilm@nanolab.dtu.dk for more information.'' | ''January 2023: The RTP Annealsys is being tested, but it is not released for general use yet. Please contact thinfilm@nanolab.dtu.dk for more information.'' | ||
[[File:LL&station Annealsys.png|250px|thumb|center|The RTP Annealsys work station and loadlock are located in the DTU Nanolab cleanroom B-1. Photo: Maria Farinha@DTU Nanolab, February 2023]] | |||
'''RTP Annealsys (RTP AS-Premium, serial number AS0415C4 - 7484, from ANNEALSYS)''' is a research tool available at DTU Nanolab that can reach very high temperatures in a matter of a few minutes or even seconds. Therefore, it is able to perform several types of rapid thermal processing and it can be used as a multi-functional and versatile microfabrication tool, within specific process windows for each process type, using Si/nanofabricated Si structures. Amongst them, there is rapid thermal annealing '''(RTA)''', hydrogenation '''(RTH)''', oxidation '''(RTO)''', nitridation '''(RTN)''', etc. Currently, it is used for '''rapid thermal annealing and smoothing''' of silicon-based samples. | '''RTP Annealsys (RTP AS-Premium, serial number AS0415C4 - 7484, from ANNEALSYS)''' is a research tool available at DTU Nanolab that can reach very high temperatures in a matter of a few minutes or even seconds. Therefore, it is able to perform several types of rapid thermal processing and it can be used as a multi-functional and versatile microfabrication tool, within specific process windows for each process type, using Si/nanofabricated Si structures. Amongst them, there is rapid thermal annealing '''(RTA)''', hydrogenation '''(RTH)''', oxidation '''(RTO)''', nitridation '''(RTN)''', etc. Currently, it is used for '''rapid thermal annealing and smoothing''' of silicon-based samples. | ||