Specific Process Knowledge/Lithography/Coaters/labspin: Difference between revisions
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!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Purpose | !style="background:silver; color:black" align="center" valign="center" rowspan="2"|Purpose | ||
|style="background:LightGrey; color:black"|Labspin | |style="background:LightGrey; color:black"|Labspin | ||
|style="background:WhiteSmoke; color:black | |style="background:WhiteSmoke; color:black"| | ||
Spin coating of resist ONLY in dedicated bowlsets | Spin coating of resist ONLY in dedicated bowlsets | ||
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|style="background:LightGrey; color:black"|All purpose | |style="background:LightGrey; color:black"|All purpose | ||
|style="background:WhiteSmoke; color:black | |style="background:WhiteSmoke; color:black"| | ||
Spin coating of dirty substances in '''All purpose''' | Spin coating of dirty substances in '''All purpose''' | ||
<br> | <br> | ||
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!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Process parameters | !style="background:silver; color:black" align="center" valign="center" rowspan="2"|Process parameters | ||
|style="background:LightGrey; color:black"|Spin speed | |style="background:LightGrey; color:black"|Spin speed | ||
|style="background:WhiteSmoke; color:black | |style="background:WhiteSmoke; color:black"| | ||
*Vacuum chuck: 100 - 5000 rpm <br> | *Vacuum chuck: 100 - 5000 rpm <br> | ||
*Edge handling chuck: Max. 3000 rpm | *Edge handling chuck: Max. 3000 rpm | ||
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|style="background:LightGrey; color:black"|Spin acceleration | |style="background:LightGrey; color:black"|Spin acceleration | ||
|style="background:WhiteSmoke; color:black | |style="background:WhiteSmoke; color:black"| | ||
*200 - 4000 rpm/s <br> | *200 - 4000 rpm/s <br> | ||
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!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates | !style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates | ||
|style="background:LightGrey; color:black" |Substrate size | |style="background:LightGrey; color:black" |Substrate size | ||
|style="background:WhiteSmoke; color:black | |style="background:WhiteSmoke; color:black"| | ||
*Chips 5x5 mm and up | *Chips 5x5 mm and up | ||
*50 mm wafers | *50 mm wafers | ||
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| style="background:LightGrey; color:black"|Allowed materials | | style="background:LightGrey; color:black"|Allowed materials | ||
|style="background:WhiteSmoke; color:black | |style="background:WhiteSmoke; color:black"| | ||
All cleanroom materials | All cleanroom materials | ||
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|style="background:LightGrey; color:black"|Batch | |style="background:LightGrey; color:black"|Batch | ||
|style="background:WhiteSmoke; color:black | |style="background:WhiteSmoke; color:black"| | ||
1 | 1 | ||
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