Specific Process Knowledge/Lithography/Resist/NILresist: Difference between revisions
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|'''mr-I 7030R''' | |'''mr-I 7030R''' | ||
| [http://www.microresist.de/en/products/nanoimprint-resists/thermal-nanoimprint-lithography/mr-i-7000r-series micro resist technology] | | [http://www.microresist.de/en/products/nanoimprint-resists/thermal-nanoimprint-lithography/mr-i-7000r-series micro resist technology] | ||
|We purchase only mr-I 7030R, | |We purchase only mr-I 7030R, to use it please contact [mailto:Lithography@nanolab.dtu.dk Lithography]. | ||
|[[media:PI_mr_I_7000R_8000R_2017.pdf|mr-I 7030R.pdf]] | |[[media:PI_mr_I_7000R_8000R_2017.pdf|mr-I 7030R.pdf]] | ||
|mr-T 1050 | |mr-T 1050 | ||
Latest revision as of 12:36, 25 August 2025
Imprint Resist Overview
Here is a table with 2 different imprint resists we have recently used in the cleanroom, with links to a purchase manufactor, technical reports about resist properties and a current process flow, tested in our cleanroom.
| Resist | Manufacturer | Comments | Technical reports | Thinner | Spinner | Rinse | Process flows (in docx-format) |
| Topas | micro resist technology | Users may purchase own resist. | Topas.pdf | LabSpin03 or LabSpin03 | IPA | ||
| mr-I 7030R | micro resist technology | We purchase only mr-I 7030R, to use it please contact Lithography. | mr-I 7030R.pdf | mr-T 1050 | LabSpin03 or LabSpin03 | Acetone | Preparation substrate with mr-I 7030R: Preparation substrate with imprint layer |