Jump to content

Specific Process Knowledge/Etch/ICP Metal Etcher/Aluminium: Difference between revisions

Jmli (talk | contribs)
No edit summary
Jmli (talk | contribs)
Line 116: Line 116:
|~282 nm/min (depending on features size and etch load)  
|~282 nm/min (depending on features size and etch load)  
|}
|}
===Al etch information supplied from STS===
[[Media:Al-etch.pdf|Al Etch Information (supplied from STS)]].