Specific Process Knowledge/Lithography/UVLithography: Difference between revisions
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#'''Exposure''': Choose which aligner you wish to use, and consider the exposure dose. | #'''Exposure''': Choose which aligner you wish to use, and consider the exposure dose. | ||
#*You can find a list of mask aligners and maskless aligners <u>[[Specific_Process_Knowledge/Lithography/UVExposure|here]]</u>. | #*You can find a list of mask aligners and maskless aligners <u>[[Specific_Process_Knowledge/Lithography/UVExposure|here]]</u>. | ||
#*You can find information on dose <u>[[Specific_Process_Knowledge/Lithography/Resist | #*You can find information on dose <u>[[Specific_Process_Knowledge/Lithography/Resist#UV_Resist|here]]</u>. | ||
#'''Development''': Choose which equipment you wish to use to develop your photoresist from <u>[[Specific_Process_Knowledge/Lithography/Development|this list]]</u>. Remember the development process influences the <u>[[Specific_Process_Knowledge/Lithography/Resist | #'''Development''': Choose which equipment you wish to use to develop your photoresist from <u>[[Specific_Process_Knowledge/Lithography/Development|this list]]</u>. Remember the development process influences the <u>[[Specific_Process_Knowledge/Lithography/Resist#UV_Resist|exposure dose]]</u>. | ||
#'''Specify whether you wish to strip or lift-off your resist''': <u>[[Specific_Process_Knowledge/Lithography/Strip|strip]]</u> and <u>[[Specific_Process_Knowledge/Lithography/LiftOff|lift-off]]</u>. | #'''Specify whether you wish to strip or lift-off your resist''': <u>[[Specific_Process_Knowledge/Lithography/Strip|strip]]</u> and <u>[[Specific_Process_Knowledge/Lithography/LiftOff|lift-off]]</u>. | ||