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Specific Process Knowledge/Etch/KOH Etch: Difference between revisions

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BGE (talk | contribs)
Bureaucrats, danchip, Administrators
2,908 edits
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|'''Etch rate in SiO<math>_2</math>'''
|'''Etch rate in SiO<math>_2</math>'''
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*~7nm/min (80 <sup>o</sup>C)
*~6nm/min (80 <sup>o</sup>C) ''theoretical value''
*~1.2nm/min (60 <sup>o</sup>C) ''theoretical value''
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