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Specific Process Knowledge/Etch/AOE (Advanced Oxide Etch): Difference between revisions

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[[Image:AOE.jpg|300x300px|thumb|AOE: positioned in cleanroom 2]]
[[Image:AOE.jpg|300x300px|thumb|AOE: positioned in cleanroom 2]]


The AOE can be used for etching silicon oxide, silicon (oxy)nitride and quartz. Look in the manuals for the AOE to see how to operate the machine (you can find the manuals in LabManager [http://labmanager.danchip.dtu.dk/machine/machine_item.aspx?id=19]).
The AOE can be used for etching silicon oxide, silicon (oxy)nitride and quartz. Look in the manuals for the AOE to see how to operate the machine (you can find the manuals in LabManager on the [http://labmanager.danchip.dtu.dk/machine/machine_item.php?refpage=machlist&id=115 AOE page]).


== Process information ==
== Process information ==
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Etch/AOE_(Advanced_Oxide_Etch)"