Specific Process Knowledge/Thermal Process/RTP Annealsys: Difference between revisions
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*Silicon Nitride | *Silicon Nitride | ||
*Aluminum Oxide | *Aluminum Oxide | ||
|style="background:WhiteSmoke; color:black;" align=" | |style="background:WhiteSmoke; color:black;" align="left"| Amongst these materials, silicon is the only allowed as substrate. Silicon nitride and aluminum oxide are used as coating/masking materials, capable of sustaining this high temperature processing. | ||
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