Specific Process Knowledge/Lithography/EBeamLithography/JEOLPatternPreparation: Difference between revisions
Appearance
| Line 73: | Line 73: | ||
== Proximity Effect Correction (PEC) == | == Proximity Effect Correction (PEC) == | ||
Proximity Effect Correction (or Proximity Error Correction) is a huge topic in EBL and here we will demonstrate the simplest way to apply PEC to your pattern using Beamer. For further information and more advanced uses of Beamer we advise users to go through the tutorials on GenISys website. | Proximity Effect Correction (or Proximity Error Correction) is a huge topic in EBL and here we will demonstrate the simplest way to apply PEC to your pattern using Beamer. For further information and more advanced uses of Beamer we advise users to go through the tutorials on [https://www.genisys-gmbh.com/webinar-series-beamer-training.html through GenISys own website.] | ||
== Pattern fracturing == | == Pattern fracturing == | ||
== Field sorting == | == Field sorting == | ||
== Export for writing == | == Export for writing == | ||