Specific Process Knowledge/Lithography/EBeamLithography/JEOLPatternPreparation: Difference between revisions
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=Pattern preparation for exposure on JEOL 9500 = | =Pattern preparation for exposure on JEOL 9500 = | ||
Prior to exposure a pattern must be prepared for exposure. The original pattern must be provided in GDS format. Depending on requirements and complexity level pattern preparation will involve all or subset of the following steps. | Prior to exposure a pattern must be prepared for exposure. The original pattern must be provided in GDS format. Depending on requirements and complexity level pattern preparation will involve all or subset of the following steps. Some steps are done using Beamer from GenISys GmbH. We advise all users to familiarise themselves with Beamer [https://www.genisys-gmbh.com/webinar-series-beamer-training.html through the tutorial series found on GeISys own website.] | ||
*Placement preparation | *Placement preparation | ||