Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-4/Slow etch: Difference between revisions
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=The slow etch= | =The slow etch= | ||
'''''This work is done by Berit Herstrøm @Nanolab | '''''This work is done by Berit Herstrøm @DTU Nanolab, is nothing else is stated''''' <br> | ||
The slow etch is designed to etch slow at low powers to etch thin films and to avoid overheating of samples mounted on a carrier with Capton/polyimide tape | The slow etch is designed to etch slow at low powers to etch thin films and to avoid overheating of samples mounted on a carrier with Capton/polyimide tape | ||