Specific Process Knowledge/Thermal Process/RTP Annealsys: Difference between revisions
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!Colspan="2" style="background:silver; color:black;" align="center"|Specifics | !Colspan="2" style="background:silver; color:black;" align="center"|Specifics | ||
|style="background: | |style="background:LightGrey; color:black;" align="center"|<b>Allowed</b> | ||
|style="background:WhiteSmoke; color:black;" align="center"|<b>Comments</b> | |style="background:WhiteSmoke; color:black;" align="center"|<b>Comments</b> | ||
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!style="background: | !style="background:Silver; color:black" align="center" align="center" rowspan="1"|Temperature | ||
|style="background: | |style="background:Silver; color:black"| | ||
|style="background: | |style="background:LightGrey; color:black"| | ||
* up to 1250 <sup>o</sup>C | * up to 1250 <sup>o</sup>C | ||
|style="background:WhiteSmoke; color:black;" align="center"| | |style="background:WhiteSmoke; color:black;" align="center"| | ||
|- | |- | ||
!style="background:silver; color:black" align="center" align="center" rowspan="4"|Process gas | !style="background:silver; color:black" align="center" align="center" rowspan="4"|Process gas | ||
|style="background: | |style="background:Silver; color:black"|Ar | ||
|style="background: | |style="background:LightGrey; color:black"| | ||
*up to 2000 SCCM | *up to 2000 SCCM | ||
|style="background:WhiteSmoke; color:black;" align="center"| | |style="background:WhiteSmoke; color:black;" align="center"| | ||
|- | |- | ||
|style="background: | |style="background:Silver; color:black"|O<sub>2 | ||
|style="background: | |style="background:LightGrey; color:black"| | ||
*up to 2000 SCCM | *up to 2000 SCCM | ||
|style="background:WhiteSmoke; color:black;" align="center"| | |style="background:WhiteSmoke; color:black;" align="center"| | ||
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|style="background: | |style="background:Silver; color:black"|NH<sub>3 | ||
|style="background: | |style="background:LightGrey; color:black"| | ||
*up to 2000 SCCM | *up to 2000 SCCM | ||
|style="background:WhiteSmoke; color:black;" align="center"| | |style="background:WhiteSmoke; color:black;" align="center"| | ||
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|style="background: | |style="background:Silver; color:black"|5% H<sub>2</sub>/Ar | ||
|style="background: | |style="background:LightGrey; color:black"| | ||
*up to 2000 SCCM | *up to 2000 SCCM | ||
|style="background:WhiteSmoke; color:black;" align="center"| | |style="background:WhiteSmoke; color:black;" align="center"| | ||
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!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Pressure | !style="background:silver; color:black" align="center" valign="center" rowspan="2"|Pressure | ||
|style="background: | |style="background:Silver; color:black"|Valve (APC) | ||
|style="background: | |style="background:LightGrey; color:black"| | ||
*0<sup>o</sup> - 100<sup>o</sup> | *0<sup>o</sup> - 100<sup>o</sup> | ||
|style="background:WhiteSmoke; color:black;" align="center"| | |style="background:WhiteSmoke; color:black;" align="center"| | ||
|- | |- | ||
|style="background: | |style="background:Silver; color:black"|Controller | ||
|style="background: | |style="background:LightGrey; color:black"| | ||
*up to 12 mbar | *up to 12 mbar | ||
|style="background:WhiteSmoke; color:black;" align="center"| | |style="background:WhiteSmoke; color:black;" align="center"| | ||
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!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates | !style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates | ||
|style="background: | |style="background:Silver; color:black"|Batch size | ||
|style="background: | |style="background:LightGrey; color:black"| | ||
*Single-wafer process | *Single-wafer process | ||
|style="background:WhiteSmoke; color:black;" align="center"| | |style="background:WhiteSmoke; color:black;" align="center"| | ||
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|style="background: | |style="background:Silver; color:black"|Substrate size | ||
|style="background: | |style="background:LightGrey; color:black"| | ||
*Chips on carrier | *Chips on carrier | ||
*100 mm or 150 mm wafers | *100 mm or 150 mm wafers | ||
|style="background:WhiteSmoke; color:black;" align="center"| | |style="background:WhiteSmoke; color:black;" align="center"| | ||
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| style="background: | | style="background:Silver; color:black"|Allowed materials | ||
|style="background: | |style="background:LightGrey; color:black"| | ||
*Silicon | *Silicon | ||
*Silicon Nitride | *Silicon Nitride | ||