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Specific Process Knowledge/Etch/KOH Etch/ProcessInfo: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
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Kabi (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
1,146 edits
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<gallery caption="Anisotropic wet silicon etch: dependency on crystal orientation" widths="380px" heights="150px" perrow="2">  
<gallery caption="Anisotropic wet silicon etch: dependency on crystal orientation" widths="380px" heights="150px" perrow="2">  
Image:KOH_Anisotropy.jpg|Etched profile when etching Si(100).
 
Image:KOH_Anisotropy(110).jpg|Etched profile when etching Si(110).
<!-- Image:KOH_Anisotropy.jpg|Etched profile when etching Si(100).-->
<!-- Image:KOH_Anisotropy(110).jpg|Etched profile when etching Si(110).-->
</gallery>
</gallery>


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