Specific Process Knowledge/Thermal Process/RTP Annealsys: Difference between revisions
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==The Set-Up== | ==The Set-Up== | ||
[[File:Set up.png|650px|thumb|right|Schematic representation of the rapid thermal processor set-up profile view. The substrate (in green) rests on top of three quartz pins, supported by a quartz holder (in black). The drawing is not to scale. Image: Inês Diogo@DTU Nanolab]] | [[File:Set up.png|650px|thumb|right|Schematic representation of the rapid thermal processor set-up profile view. The substrate (in green) rests on top of three quartz pins, supported by a quartz holder (in black). The drawing is not to scale. | ||
Image: Inês Diogo@DTU Nanolab, December 2022]] | |||
The RTP Annealsys system is divided into two main parts: the process chamber and the loadlock. | The RTP Annealsys system is divided into two main parts: the process chamber and the loadlock. | ||