Specific Process Knowledge/Etch/KOH Etch/ProcessInfo: Difference between revisions
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===Etch rates: Empirical formula (Seidl et al)=== | <!-- ===Etch rates: Empirical formula (Seidl et al)=== | ||
The following empirical formula can be used for concentrations in the range of 10-60 wt%: | The following empirical formula can be used for concentrations in the range of 10-60 wt%: | ||
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where k<sub>0</sub> = 2480 µm/hr (mol/l)<sup>-4.25</sup>, E<sub>a</sub> = 0.595 eV for Si(100) | where k<sub>0</sub> = 2480 µm/hr (mol/l)<sup>-4.25</sup>, E<sub>a</sub> = 0.595 eV for Si(100) | ||
and k<sub>0</sub> = 4500 µm/hr (mol/l)<sup>-4.25</sup>, E<sub>a</sub> = 0.60 eV for Si(110) | and k<sub>0</sub> = 4500 µm/hr (mol/l)<sup>-4.25</sup>, E<sub>a</sub> = 0.60 eV for Si(110) --> | ||