Specific Process Knowledge/Etch/Etching of Silicon Oxide: Difference between revisions
No edit summary Tag: Reverted |
No edit summary Tag: Manual revert |
||
| Line 281: | Line 281: | ||
The recipe ICP is on ICP metal call: A SiO2 etch with C4F8 with resist mask<br> | The recipe ICP is on ICP metal call: A SiO2 etch with C4F8 with resist mask<br> | ||
I had problems with this recipe - it gave polymer on the surface, therefor I do not have more info on that.<br> | I had problems with this recipe - it gave polymer on the surface, therefor I do not have more info on that.<br> | ||