Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-2/ORE with Al2O3 mask: Difference between revisions
| Line 7: | Line 7: | ||
=Al<sub>2</sub>O<sub>3</sub> mask= | =Al<sub>2</sub>O<sub>3</sub> mask= | ||
[[File:esq met Al2O3 compact.jpg|300px|right|thumb|'''''Scheme of the sample fabrication using Al<sub>2</sub>O<sub>3</sub> mask. These samples were coated with either 50 or 100 nm of Al<sub>2</sub>O<sub>3</sub>, followed by 65 nm of BARC and 750 nm of DUV resist. Not at scale. | [[File:esq met Al2O3 compact.jpg|300px|right|thumb|'''''Scheme of the sample fabrication using Al<sub>2</sub>O<sub>3</sub> mask. These samples were coated with either 50 or 100 nm of Al<sub>2</sub>O<sub>3</sub>, followed by 65 nm of BARC and 750 nm of DUV resist. Not at scale. <br> | ||
<br> | |||
Scheme: Maria Farinha, @DTU Nanolab''''']] | Scheme: Maria Farinha, @DTU Nanolab''''']] | ||