Jump to content

Specific Process Knowledge/Thin film deposition/Lesker: Difference between revisions

Tg (talk | contribs)
No edit summary
Jehan (talk | contribs)
No edit summary
Line 14: Line 14:
*[[Specific Process Knowledge/Thin film deposition/Deposition of Silicon|Silicon (Si)]]
*[[Specific Process Knowledge/Thin film deposition/Deposition of Silicon|Silicon (Si)]]
*Iron (Fe)
*Iron (Fe)
*+ many more (ask)


Contcat the pvd-group if you have special needs (pvd@danchip.dtu.dk).
Contact the pvd-group if you have special needs (pvd@danchip.dtu.dk).




==Overview of the performance of Alcatel and some process related parameters==
==Overview of the performance of Sputter-System(Lesker) and some process related parameters==


{| border="2" cellspacing="0" cellpadding="10"  
{| border="2" cellspacing="0" cellpadding="10"