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Specific Process Knowledge/Lithography/EBeamLithography/JEOLPatternPreparation: Difference between revisions

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[[File:RoughFineScan.png|250px|center|frameless]]
[[File:RoughFineScan.png|250px|center|frameless]]
=== Placement of alignment marks ===
Before exposure the pattern must be converted to JEOL52 V3.0, or V30 for short. V30 does not suppport negative coordinates and hence all pattern elements are move to the positive part of the coordinate system upon conversion. This can lead to gross offsets between layers if they are not moved into positive space by the same amount.
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