Specific Process Knowledge/Thermal Process/RTP Annealsys: Difference between revisions
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==The Set-Up== | ==The Set-Up== | ||
The RTP Annealsys system is divided into two main parts: the process chamber and the loadlock. | The RTP Annealsys system is divided into two main parts: the process chamber and the loadlock. | ||
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Similarly, the loadlock is also connected to two external pumps. Moreover, the chamber and the loadlock are separated by the gate valve. While processing, the valve remains closed; it is only opened to exchange the substrates when both chamber and loadlock are under turbo vacuum. The substrate transfer is possible due to the mechanical, retractable arm. | Similarly, the loadlock is also connected to two external pumps. Moreover, the chamber and the loadlock are separated by the gate valve. While processing, the valve remains closed; it is only opened to exchange the substrates when both chamber and loadlock are under turbo vacuum. The substrate transfer is possible due to the mechanical, retractable arm. | ||
[[File:Set up.png|650px|thumb|right|Schematic representation of the rapid thermal processor set-up profile view. The substrate (in green) rests on top of three quartz pins, supported by a quartz holder (in black). The drawing is not to scale. Image: Inês Diogo@DTU Nanolab]] | |||
==Temperature Measurement and Control== | ==Temperature Measurement and Control== | ||