Specific Process Knowledge/Thermal Process/RTP Annealsys: Difference between revisions
Appearance
| Line 87: | Line 87: | ||
[[media:Report_Annealsys_2022.pdf|Report_Annealsys_December22 by Inês Diogo@DTU Nanolab]] | [[media:Report_Annealsys_2022.pdf|Report_Annealsys_December22 by Inês Diogo@DTU Nanolab]] | ||
[[media:Dissertation_ID_Rapid Thermal Processing and its Effects on High Aspect Ratio Silicon Features.pdf|Rapid Thermal Annealing and its Effects on | [[media:Dissertation_ID_Rapid Thermal Processing and its Effects on High Aspect Ratio Silicon Features.pdf|Rapid Thermal Annealing and its Effects on High Aspect Ratio Silicon Features_MasterThesis_ID by Inês Diogo@DTU Nanolab]] | ||
'''''Important remark: The RTO sequences developed during the previous experimental work on the RTP Annealsys are not available. More tests and further investigation is required to prevent any damage to the tool.''''' | '''''Important remark: The RTO sequences developed during the previous experimental work on the RTP Annealsys are not available. More tests and further investigation is required to prevent any damage to the tool.''''' | ||