Specific Process Knowledge/Lithography/SU-8: Difference between revisions
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==Pretreatment== | ==Pretreatment== | ||
* To dehydrate the surface, bake in 250C oven at least 30 min | * To dehydrate the surface, bake in 250C oven at least 30 min - the longer the bake, the better. Baking overnight is recommended | ||
* Another dehydration step can be done in the HMDS oven using recipe 9. This does not expose the wafers to HMDS but instead makes a | * Another dehydration step can be done in the HMDS oven using recipe 9. This does not expose the wafers to HMDS but instead makes a bake-out at reduced pressure | ||
==Spinning== | ==Spinning== | ||