Specific Process Knowledge/Thermal Process/RTP Annealsys: Difference between revisions
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'''Flipped''' = Facing the carrier wafer; '''HF dip''' = 30s-HF chemical bath, immediately prior to processing. | '''Flipped''' = Facing the carrier wafer; '''HF dip''' = 30s-HF chemical bath, immediately prior to processing. | ||
‘RTA 1’ experiment aimed to study the influence of RTA sequences on chromium (Cr). As such, type I samples were used, before the Cr hard-mask removal. The results are shown on the right. | |||
==== RTH ==== | ==== RTH ==== | ||