Specific Process Knowledge/Lithography/5214E: Difference between revisions
Appearance
No edit summary |
No edit summary |
||
| Line 1: | Line 1: | ||
__TOC__ | __TOC__ | ||
AZ 5214E is a positive UV photoresist with image reversal capability. | ==Resist description== | ||
AZ 5214E is a positive UV photoresist with image reversal capability. It is considered to have good adhesion when wet etching. | |||
==Spin coating== | ==Spin coating== | ||
[[Image:5214Espincurves.JPG|500x500px|thumb|Spin curves for AZ 5214E using a | [[Image:5214Espincurves.JPG|500x500px|thumb|Spin curves for AZ 5214E using a 30 s spin-off, and a 60s @ 90°C softbake]] | ||
'''Typical spin parameters:''' | '''Typical spin parameters:''' | ||