Jump to content

Specific Process Knowledge/Lithography/5214E: Difference between revisions

Jehem (talk | contribs)
No edit summary
Jehem (talk | contribs)
No edit summary
Line 1: Line 1:
__TOC__
__TOC__


AZ 5214E is a positive UV photoresist with image reversal capability.
==Resist description==
AZ 5214E is a positive UV photoresist with image reversal capability. It is considered to have good adhesion when wet etching.


==Spin coating==
==Spin coating==
[[Image:5214Espincurves.JPG|500x500px|thumb|Spin curves for AZ 5214E using a 30s spin-off, and a 60s@90°C softbake]]
[[Image:5214Espincurves.JPG|500x500px|thumb|Spin curves for AZ 5214E using a 30 s spin-off, and a 60s @ 90°C softbake]]


'''Typical spin parameters:'''
'''Typical spin parameters:'''