Specific Process Knowledge/Lithography/Resist/UVresist: Difference between revisions
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!rowspan="2"| AZ 5214E image reversal<br><span style="color:red">Old German version</span> | !rowspan="2"| AZ 5214E image reversal<br><span style="color:red">Old German version</span> | ||
| 2020-03-01<br>taran | | 2020-03-01<br>taran | ||
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| >2 µm (a lot of stitching) | | >2 µm (a lot of stitching) | ||
| Reversal bake: 120s@110°C, Flood exposure: 200mJ/cm<sup>2</sup>, Dev: SP60s | | Reversal bake: 120s@110°C, Flood exposure: 200mJ/cm<sup>2</sup>, Dev: SP60s | ||
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|-style="background:silver; color:black" | |||
| 2021-08-25<br>jehem | | 2021-08-25<br>jehem | ||
| 2.2 µm | | 2.2 µm | ||
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!rowspan="2"| AZ nLOF 2020 | !rowspan="2"| AZ nLOF 2020 | ||
| 2020-02-01<br>jehem | | 2020-02-01<br>jehem | ||
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| 2 µm (due to stitching) | | 2 µm (due to stitching) | ||
| PEB: 60s@110°C, Dev: SP60s | | PEB: 60s@110°C, Dev: SP60s | ||
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| 2020-03-01<br>taran | | 2020-03-01<br>taran | ||
| 2.0 µm | | 2.0 µm | ||
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| 1.75 µm | | 1.75 µm | ||
| Dev: SP60s | | Dev: SP60s | ||
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!AZ 5214E image reversal<br><span style="color:green">New Japanese version</span> | !AZ 5214E image reversal<br><span style="color:green">New Japanese version</span> | ||
| 2023-01-11<br>jehem | | 2023-01-11<br>jehem | ||
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!AZ 4562<br><span style="color:green">New Japanese version</span> | !AZ 4562<br><span style="color:green">New Japanese version</span> | ||
| 2021-12-07<br>jehem | | 2021-12-07<br>jehem | ||
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'''Dehydration reducing measures used for testing AZ MiR 701:'''<br> | '''Dehydration reducing measures used for testing AZ MiR 701:'''<br> | ||
The CDA used for the pneumatic autofocus will dehydrate the resist. To reduce this effect, the writehead is parked far away from the write area while setting up the job for at least a few minutes, before starting the exposure. | The CDA used for the pneumatic autofocus will dehydrate the resist. To reduce this effect, the writehead is parked far away from the write area while setting up the job for at least a few minutes, before starting the exposure. | ||
===Aligner: Maskless 02=== | ===Aligner: Maskless 02=== | ||