Specific Process Knowledge/Lithography/Descum: Difference between revisions
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Descum of AZ Mir 701 resist on 100mm silicon wafer. Five wafers were placed vertically in chamber. | Descum of AZ Mir 701 resist on 100mm silicon wafer. Five wafers were placed vertically in chamber. | ||
'''recipe 1''' | |||
'''recipe 1:''' | |||
*O2 flow: 100 ml/min | *O2 flow: 100 ml/min | ||
*N2 flow: 100 ml/min | *N2 flow: 100 ml/min | ||
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[[image:graf_descum-recipe2.png|640px|thumb|Descum results plasma asher 2 - recipe 2]] | [[image:graf_descum-recipe2.png|640px|thumb|Descum results plasma asher 2 - recipe 2]] | ||
'''recipe 2''' | |||
'''recipe 2:''' | |||
*O2 flow: 500 ml/min | *O2 flow: 500 ml/min | ||
*N2 flow: 0 ml/min | *N2 flow: 0 ml/min | ||