Specific Process Knowledge/Lithography/Descum: Difference between revisions
| Line 20: | Line 20: | ||
*N2 flow: 70 ml/min | *N2 flow: 70 ml/min | ||
*Power: 150 W | *Power: 150 W | ||
{| border="1" cellspacing="1" cellpadding="2" align=" | {| {{table}} | ||
| align="center" | | |||
{| border="1" cellspacing="1" cellpadding="2" align="left" | |||
|- style="background:LightGrey" | |- style="background:LightGrey" | ||
|'''Ashing time (min)'''|| 1|| 2 || 5 || 7 || 10 || 10 | |'''Ashing time (min)'''|| 1|| 2 || 5 || 7 || 10 || 10 | ||
| Line 26: | Line 28: | ||
|'''Etched Thickness (nm)'''|| 14.2 || 16.3 || 47.6 || 123.2 || 854.3 || 862.1 | |'''Etched Thickness (nm)'''|| 14.2 || 16.3 || 47.6 || 123.2 || 854.3 || 862.1 | ||
|- | |- | ||
|} | |||
|} | |} | ||
'''Recipe 2:'''<br> | |||
Note: Plasma asher was cold before use | |||
*O2 flow: 500 ml/min | |||
*N2 flow: 0 ml/min | |||
*Power: 500 W | |||
{| {{table}} | {| {{table}} | ||
| align="center" | | | align="center" | | ||
{| border="1" cellspacing="1" cellpadding="2" align=" | {| border="1" cellspacing="1" cellpadding="2" align="left" | ||
|- style="background:LightGrey" | |- style="background:LightGrey" | ||
|| | |'''Ashing time (min)'''|| 1|| 2 || 5 || 7 || 10 || 10 | ||
| 1 || 2 || 5 || 7 || 10 || 10 | |- | ||
|- | |'''Etched Thickness (nm)'''|| || 8.1 || 32.9 || 271.1 || 495.6 || 446.2 | ||
| | |||
|- | |- | ||
|} | |} | ||
|} | |} | ||
Conny Hjort & Jesper Hanberg | Conny Hjort & Jesper Hanberg | ||