Specific Process Knowledge/Thermal Process/RTP Annealsys: Difference between revisions
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===Test Samples=== | ===Test Samples=== | ||
[[File:Set up.png|700px|thumb|right|Schematic representation of the rapid thermal processor set-up profile view. The substrate (in green) rests on top of three quartz pins, supported by a quartz holder (in black). The drawing is not to scale.]] | |||
Various test samples were used, which are represented on the right. Type I, II and III samples are 1 cm x 1 cm chips. Type IV and V are 150 mm Si <100> n-type wafers, with grown BSi and without native oxide, respectively. | Various test samples were used, which are represented on the right. Type I, II and III samples are 1 cm x 1 cm chips. Type IV and V are 150 mm Si <100> n-type wafers, with grown BSi and without native oxide, respectively. | ||
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