Specific Process Knowledge/Thermal Process/RTP Annealsys: Difference between revisions

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 ===Test Samples===
-Various test samples were used, which are represented on the right. Type I, II and III samples are 1 cm x 1 cm chips. Type IV and V are 150 mm Si <100> wafers, with grown BSi and without native oxide, respectively.
+Various test samples were used, which are represented on the right. Type I, II and III samples are 1 cm x 1 cm chips. Type IV and V are 150 mm Si <100> n-type wafers, with grown BSi and without native oxide, respectively.
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