Specific Process Knowledge/Etch/Overview of chemicals: Difference between revisions
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!style="background:silver; color:black;" align="left"|AZ 726MIF developer (Tromle) | !style="background:silver; color:black;" align="left"|AZ 726MIF developer (Tromle) | ||
!style="background:LightGrey; color:black;"|[https://kemibrug.dk/Kemikalier/Action?id= | !style="background:LightGrey; color:black;"|[https://kemibrug.dk/Kemikalier/Action?id=RCU2MHolYzIlODIlN2UlYzIlODB2JWMyJTgxJTdleiVjMiU4N0RZeiVjMiU4OXYlN2UlYzIlODElYzIlODhETkVFTUVGR1RkJWMyJTg3JTdjdiVjMiU4MyU3ZSVjMiU4OHYlYzIlODklN2UlYzIlODQlYzIlODMlYzIlODglNWVZUkk=#K Cas Nr. no nr.] | ||
!style="background:LightGrey; color:black;"|not specific | !style="background:LightGrey; color:black;"|not specific | ||
!style="background:LightGrey; color:black;"|not specific | !style="background:LightGrey; color:black;"|not specific | ||
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!style="background:silver; color:black;" align="left"|AZ MiR 701 (29CPS) Photoresist | !style="background:silver; color:black;" align="left"|AZ MiR 701 (29CPS) Photoresist | ||
!style="background:LightGrey; color:black;"|[https://kemibrug.dk/Kemikalier/Action?id= | !style="background:LightGrey; color:black;"|[https://kemibrug.dk/Kemikalier/Action?id=RCU2MHolYzIlODIlN2UlYzIlODB2JWMyJTgxJTdleiVjMiU4N0RZeiVjMiU4OXYlN2UlYzIlODElYzIlODhERkVGTU5NSFRkJWMyJTg3JTdjdiVjMiU4MyU3ZSVjMiU4OHYlYzIlODklN2UlYzIlODQlYzIlODMlYzIlODglNWVZUkk=#K Cas Nr. No nr.] | ||
!style="background:LightGrey; color:black;"|not specific | !style="background:LightGrey; color:black;"|not specific | ||
!style="background:LightGrey; color:black;"|not specific | !style="background:LightGrey; color:black;"|not specific | ||