Specific Process Knowledge/Lithography/Coaters/Spin Coater: Gamma UV processing: Difference between revisions
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==AZ "5206E" coating (syringe)== | ==AZ "5206E" coating (syringe)== | ||
Spin coating of AZ 5206E (AZ 5214E 1:1 by volume in PGMEA) dispensed from syringe on Spin Coater: Gamma UV is divided into three steps: HMDS priming, spin coating, and soft baking. The HMDS priming is equal to the ''HMDS fast'' process. The spin coating uses dynamic dispense of resist at 800? rpm, using a volume of 1.5 ml for 100 mm substrates. The dispense is followed by spin-off at a thickness dependent spin speed for 30 seconds. The thickness range is approximately 0.4-0.6µm. Soft baking is done at 90°C for 60s. | Spin coating of AZ 5206E (AZ 5214E 1:1 by volume in PGMEA) dispensed from syringe on Spin Coater: Gamma UV is divided into three steps: HMDS priming, spin coating, and soft baking. The HMDS priming is equal to the ''HMDS fast'' process. The spin coating uses dynamic dispense of resist at 800? rpm, using a volume of 1.5 ml for 100 mm substrates. The dispense is followed by spin-off at a thickness dependent spin speed for 30 seconds. The thickness range is approximately 0.4-0.6µm. Soft baking is done at 90°C for 60s. | ||