Specific Process Knowledge/Lithography/Coaters/GammaUV: Difference between revisions
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[[image:SpinCoaterGammaUV.jpg|400px|right|thumb|Spin Coater: Gamma UV in E-5]] | [[image:SpinCoaterGammaUV.jpg|400px|right|thumb|Spin Coater: Gamma UV in E-5]] | ||
Spin Coater: Gamma UV was installed at DTU Nanolab in March 2015. It is a Gamma 2M cluster from Süss MicroTec with spin coating, vapour priming, and baking modules. The system handles 4" and 6" wafers without size conversion, and can be set up to handle 2" or 8". | Spin Coater: Gamma UV was installed at DTU Nanolab in March 2015. It is a Gamma 2M cluster from Süss MicroTec with spin coating, HMDS vapour priming, and baking modules. | ||
The system handles 4" and 6" wafers without size conversion, and can be set up to handle 2" or 8". | |||
The coater is equipped with 3 different resists lines: | The coater is equipped with 3 different resists lines: | ||
*AZ MiR 701 | *AZ MiR 701 | ||
*AZ nLOF 2020 | *AZ nLOF 2020 | ||
*AZ 5214E | *AZ 5214E | ||
*Syringe, which can be used for various resists | |||
* | |||
The processes that are available on the system are developed by Nanolab. Upon request, it is possible to establish new processes. Use of the syringe requires special training, and would as a starting point require batches in excess of 20 wafers. | The processes that are available on the system are developed by Nanolab. Upon request, it is possible to establish new processes. Use of the syringe requires special training, and would as a starting point require batches in excess of 20 wafers. | ||