Jump to content

Specific Process Knowledge/Lithography/Resist/UVresist: Difference between revisions

Jehem (talk | contribs)
Jehem (talk | contribs)
Line 158: Line 158:
*High aspect ratio
*High aspect ratio
*Resist thickness 1 µm to several 100 µm
*Resist thickness 1 µm to several 100 µm
|-
|-
|-style="background:silver; color:black"
!Process flow examples
|
|
|
|
|
|-
|-