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Specific Process Knowledge/Lithography/Resist/UVresist: Difference between revisions

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Jehem (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, danchip
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==Aligner: Maskless 02==
==Aligner: Maskless 02==
The Aligner: Maskless 01 has a 325 nm laser light source, and a 405 nm laser light source, each with a FWHM of ~1 nm.
The Aligner: Maskless 02 has a 375 nm laser light source, and a 405 nm laser light source, each with a FWHM of ~1 nm.


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