Specific Process Knowledge/Lithography/Resist/UVresist: Difference between revisions

← Older edit Newer edit →

VisualWikitext

@@ Line 673: / Line 673: @@
 ==Aligner: Maskless 03==
+{|border="1" cellspacing="1" cellpadding="7" style="text-align:left;"
+|-
+|-
+|-style="background:silver; color:black"
+|
+!Date
+!Thickness
+!Exposure mode
+!Dose
+!Defoc
+!Resolution
+!Comments
+|-
+|-
+|-style="background:WhiteSmoke; color:black"
+!rowspan="2"| AZ 5214E<br><span style="color:red">Old German version</span>
+| 2020-10-01<br>jehem
+|rowspan="2"| 1.5 µm
+| Fast
+| 70 mJ/cm<sup>2</sup>
+| 0
+| 2 µm (due to stitching)
+| Dev: SP60s
+|-style="background:WhiteSmoke; color:black"
+| 2021-03-23<br>jehem
+| Quality
+| 65 mJ/cm<sup>2</sup>
+| -2
+| 1 µm
+| Dev: SP60s
+|-
+|-
+|-style="background:WhiteSmoke; color:black"
+!rowspan="2"| AZ MiR 701<br><span style="color:red">Old PFOA containing version</span>
+| 2020-02-01<br>jehem
+|rowspan="2"| 1.5 µm
+| Fast
+| 300 mJ/cm<sup>2</sup>
+| 0
+| 2 µm (due to stitching)<br>Non optimized dehydration reduction
+| PEB: 60s@110°C, Dev: SP60s
+|-style="background:WhiteSmoke; color:black"
+| 2021-08-25<br>jehem
+| Quality
+| 175 mJ/cm<sup>2</sup>
+| -2
+| 1 µm<br>Tested using dehydration reducing measures
+| PEB: 60s@110°C, Dev: SP60s
+|-
+|-
+|-style="background:WhiteSmoke; color:black"
+!rowspan="2"| AZ 5214E image reversal<br><span style="color:red">Old German version</span>
+| 2020-10-01<br>jehem
+|rowspan="2"| 2.2 µm
+| Fast
+| 43 mJ/cm<sup>2</sup>
+| 0
+| >2 µm (a lot of stitching)
+| Reversal bake: 120s@110°C, Flood exposure: 200mJ/cm<sup>2</sup>, Dev: SP60s
+|-style="background:WhiteSmoke; color:black"
+| 2021-08-25<br>jehem
+| Quality
+| 32 mJ/cm<sup>2</sup>
+| -1
+| 1 µm
+| Reversal bake: 120s@110°C, Flood exposure: 200mJ/cm<sup>2</sup>, Dev: SP60s
+|-
+|}
+'''AZ nLOF 2020''' has also been tested. It seems to work even at 405nm, but the dose is so high (>10000) that exposure would be slower than Aligner: Maskless 02.
+<br>
+<br>
+{|border="1" cellspacing="1" cellpadding="7" style="text-align:left;"
+|-
+|-
+|-style="background:silver; color:black"
+|
+!Date
+!Thickness
+!Laser
+!Autofocus
+!Exposure mode
+!Dose
+!Defoc
+!Resolution
+!Comments
+|-
+|-
+|-style="background:WhiteSmoke; color:black"
+!AZ 5214E<br><span style="color:green">New Japanese version</span>
+| 2023-01-06<br>taran
+| 1.5 µm
+| 405
+| Pneumatic
+| Quality
+| 70 mJ/cm<sup>2</sup>
+| -2
+| 1 µm
+| Dev: SP60s
+|-style="background:WhiteSmoke; color:black"
+|-
+|-
+|-style="background:LightGrey; color:black"
+!AZ 5214E image reversal<br><span style="color:green">New Japanese version</span>
+| 2023-01-06<br>taran
+| 2.2 µm
+| 405
+| Pneumatic
+| Quality
+| 50 mJ/cm<sup>2</sup>
+| -2
+| 1 µm
+| Reversal bake: 60s@110°C, Flood exposure: 500mJ/cm<sup>2</sup>, Dev: SP60s
+|-
+|-
+|-style="background:WhiteSmoke; color:black"
+!AZ MiR 701<br><span style="color:green">New PFOA free version</span>
+| 2021-08-25<br>jehem
+| 1.5 µm
+| 405
+| Pneumatic
+| Quality
+| 175 mJ/cm<sup>2</sup>
+| -2
+| 1 µm<br>Tested using dehydration reducing measures
+| PEB: 60s@110°C, Dev: SP60s
+|-
+|-
+|-style="background:LightGrey; color:black"
+!AZ 4562<br><span style="color:green">New Japanese version</span>
+| 2021-12-08<br>jehem
+| 10 µm
+| 405
+| Pneumatic
+| Quality
+| 550 mJ/cm<sup>2</sup>
+| 1
+| ≤5 µm
+| Priming: HMDS<BR>Rehydration after SB: 1 hour (may not be necessary)<br>Exposure: Multiple exposures with pauses, 5 x (10 s exposure + 10 s pause)<br>Degassing after exposure: 1 hour (may not be necessary)<br>Development: Multiple puddles, 5 x 60 s
+|-
+|}
+<br>
+'''Dehydration reducing measures used for testing AZ MiR 701:'''<br>
+The CDA used for the pneumatic autofocus will dehydrate the resist. To reduce this effect, the writehead is parked far away from the write area while setting up the job for at least a few minutes, before starting the exposure.
 =Exposure dose when using AZ 351B developer (NaOH)=