Specific Process Knowledge/Lithography/Resist/UVresist: Difference between revisions
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==Aligner: Maskless 02== | ==Aligner: Maskless 02== | ||
{|border="1" cellspacing="1" cellpadding="7" style="text-align:left;" | |||
|- | |||
|- | |||
|-style="background:silver; color:black" | |||
| | |||
!Date | |||
!Thickness | |||
!Laser | |||
!Exposure mode | |||
!Dose | |||
!Defoc | |||
!Resolution | |||
!Comments | |||
|- | |||
|- | |||
|-style="background:WhiteSmoke; color:black" | |||
!rowspan="2"| AZ 5206E<br>(AZ5214E diluted with PGMEA 1:1 per volume)<br><span style="color:red">Old German version</span> | |||
| Long ago | |||
|rowspan="2"| 0.5 µm | |||
|rowspan="2"| 375 nm | |||
| Fast | |||
| 60 mJ/cm<sup>2</sup> | |||
| -6 | |||
| 1 µm (not optimized) | |||
| Dev: 2xSP30s | |||
|-style="background:WhiteSmoke; color:black" | |||
| Long ago | |||
| Quality | |||
| 60 mJ/cm<sup>2</sup> | |||
| -6 | |||
| ~750 nm (not optimized) | |||
| Dev: 2xSP30s | |||
|- | |||
|- | |||
|-style="background:LightGrey; color:black" | |||
!rowspan="3"| AZ 5214E<br><span style="color:red">Old German version</span> | |||
| Long ago | |||
|rowspan="3"| 1.5 µm | |||
| 405 nm | |||
| Fast | |||
| 90 mJ/cm<sup>2</sup> | |||
| -2 | |||
| 1-2 µm | |||
| Dev: SP60s | |||
|-style="background:LightGrey; color:black" | |||
| Long ago | |||
|rowspan="2"| 375 nm | |||
| Fast | |||
| 65 mJ/cm<sup>2</sup> | |||
| 2 | |||
| ~1 µm | |||
| Dev: SP60s | |||
|-style="background:LightGrey; color:black" | |||
| Long ago | |||
| Quality | |||
| 65 mJ/cm<sup>2</sup> | |||
| 2 | |||
| ~750 nm | |||
| Dev: SP60s | |||
|- | |||
|- | |||
|-style="background:WhiteSmoke; color:black" | |||
!rowspan="3"| AZ MiR 701<br><span style="color:red">Old PFOA containing version</span> | |||
| Long ago | |||
|rowspan="3"| 1.5 µm | |||
| 405 nm | |||
| Fast | |||
| 200 mJ/cm<sup>2</sup> | |||
| -5 | |||
| ~1 µm (not optimized) | |||
| PEB: 60s@110°C, Dev: SP60s | |||
|-style="background:WhiteSmoke; color:black" | |||
| Long ago | |||
|rowspan="2"| 375 nm | |||
| Fast | |||
| 170 mJ/cm<sup>2</sup> | |||
| -5 | |||
| 1 µm | |||
| PEB: 60s@110°C, Dev: SP60s | |||
|-style="background:WhiteSmoke; color:black" | |||
| Long ago | |||
| Quality | |||
| 180 mJ/cm<sup>2</sup> | |||
| -6 (Feb 2019) <br> -2 (Apr 2019) | |||
| <750 nm | |||
| PEB: 60s@110°C, Dev: SP60s <br> Large structures probably over-exposed | |||
|- | |||
|- | |||
|-style="background:LightGrey; color:black" | |||
!rowspan="2"| AZ nLOF 2020 | |||
| 2021-02-22<br>jehem | |||
|rowspan="2"| 2 µm | |||
|rowspan="2"| 375 nm | |||
| Fast | |||
| 350 mJ/cm<sup>2</sup> | |||
| 0 | |||
| 1 µm | |||
| PEB: 120s@110°C, Dev: SP60s | |||
|-style="background:LightGrey; color:black" | |||
| 2021-02-22<br>jehem | |||
| Quality | |||
| 350 mJ/cm<sup>2</sup> | |||
| 0 | |||
| 1 µm | |||
| PEB: 120s@110°C, Dev: SP60s | |||
|- | |||
|} | |||
<br> | |||
{|border="1" cellspacing="1" cellpadding="7" style="text-align:left;" | |||
|- | |||
|- | |||
|-style="background:silver; color:black" | |||
| | |||
!Date | |||
!Thickness | |||
!Laser | |||
!Autofocus | |||
!Exposure mode | |||
!Dose | |||
!Defoc | |||
!Resolution | |||
!Comments | |||
|- | |||
|- | |||
|-style="background:WhiteSmoke; color:black" | |||
!AZ 5214E<br><span style="color:green">New Japanese version</span> | |||
| 2021-08-20<br>jehem | |||
| 1.5 µm | |||
| 375 | |||
| Optical | |||
| Fast | |||
| 70 mJ/cm<sup>2</sup> | |||
| -4 | |||
| 1 µm | |||
| Dev: SP60s | |||
|-style="background:WhiteSmoke; color:black" | |||
|- | |||
|- | |||
|-style="background:LightGrey; color:black" | |||
!AZ 5214E image reversal<br><span style="color:green">New Japanese version</span> | |||
| 2021-11-25<br>jehem | |||
| 2.2 µm | |||
| 375 | |||
| Optical | |||
| Fast | |||
| <s>16 mJ/cm<sup>2</sup></s> | |||
| <s>-4</s> | |||
| <s>1.75 µm</s> | |||
| Reversal bake: 60s@110°C, Flood exposure: 500mJ/cm<sup>2</sup>, Dev: SP60s | |||
|- | |||
|- | |||
|-style="background:WhiteSmoke; color:black" | |||
!AZ MiR 701<br><span style="color:green">New PFOA free version</span> | |||
| 2021-08-20<br>jehem | |||
| 1.5 µm | |||
| 375 | |||
| Optical | |||
| Fast | |||
| 200 mJ/cm<sup>2</sup> | |||
| -6 | |||
| 1 µm<br>Tested using dehydration reducing measures | |||
| PEB: 60s@110°C, Dev: SP60s | |||
|- | |||
|- | |||
|-style="background:LightGrey; color:black" | |||
!AZ 4562<br><span style="color:green">New Japanese version</span> | |||
| 2021-12-08<br>jehem | |||
| 10 µm | |||
| 375 | |||
| Optical | |||
| Fast | |||
| 750 mJ/cm<sup>2</sup> | |||
| 0 | |||
| ≤5 µm | |||
| Priming: HMDS<BR>Rehydration after SB: 1 hour (may not be necessary)<br>Exposure: Multiple exposures with pauses, 5 x (10 s exposure + 10 s pause)<br>Degassing after exposure: 1 hour (may not be necessary)<br>Development: Multiple puddles, 5 x 60 s | |||
|- | |||
|} | |||
<br> | |||
'''Dehydration reducing measures used for testing AZ MiR 701:'''<br> | |||
The CDA used for the pneumatic autofocus will dehydrate the resist. To reduce this effect, the writehead is parked far away from the write area while setting up the job for at least a few minutes, before starting the exposure. | |||
==Aligner: Maskless 03== | ==Aligner: Maskless 03== | ||