Specific Process Knowledge/Lithography/Resist/UVresist: Difference between revisions
| Line 12: | Line 12: | ||
|-style="background:silver; color:black" | |-style="background:silver; color:black" | ||
!Resist | !Resist | ||
| | |AZ 5214E | ||
| | |AZ MiR 701 | ||
| | |AZ nLOF 202 | ||
| | |AZ 4562 | ||
| | |SU-8 20xx | ||
|- | |- | ||
| Line 23: | Line 23: | ||
!Resist tone | !Resist tone | ||
| | | | ||
| | *Positive | ||
| | *Negative (image reversal) | ||
| | |Positive | ||
| | |Negative | ||
|Positive | |||
|Negative | |||
|- | |- | ||
|-style="background:silver; color:black" | |-style="background:silver; color:black" | ||
!Thickness range | !Thickness range | ||
| | |1.5 - 4.2 µm | ||
| | |1.5 - 4 µm | ||
| | |1.5 - 4 µm | ||
| | |5 - 10 µm | ||
| | |1 - 200 µm | ||
|- | |- | ||
| Line 42: | Line 44: | ||
!Coating tool | !Coating tool | ||
| | | | ||
Automatic coaters:<br> | |||
*Spin coater: Gamma UV lithography | |||
*Spin coater: Gamma ebeam & UV | |||
Manual coaters:<br> | |||
*Spin coater: Labspin 2 | |||
*Spin coater: Labspin 3 | |||
*Spin coater: RCD8 | |||
*Spray coater | |||
| | | | ||
Automatic coaters:<br> | |||
*Spin coater: Gamma UV lithography | |||
*Spin coater: Gamma ebeam & UV | |||
Manual coaters:<br> | |||
*Spin coater: Labspin 2 | |||
*Spin coater: Labspin 3 | |||
*Spin coater: RCD8 | |||
*Spray coater | |||
| | | | ||
Automatic coaters:<br> | |||
*Spin coater: Gamma UV lithography | |||
Manual coaters:<br> | |||
*Spin coater: Labspin 2 | |||
*Spin coater: Labspin 3 | |||
*Spin coater: RCD8 | |||
*Spray coater | |||
| | | | ||
Automatic coaters:<br> | |||
*Spin coater: Gamma ebeam & UV | |||
Manual coaters:<br> | |||
*Spin coater: Labspin 2 | |||
*Spin coater: Labspin 3 | |||
*Spin coater: RCD8 | |||
| | | | ||
Manual coaters:<br> | |||
*Spin coater: RCD8 | |||
|- | |- | ||