Specific Process Knowledge/Lithography/Resist/UVresist: Difference between revisions
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The Aligner: MA6-2 has an i-line notch filter installed. This results in an exposure light peak around 365 nm with a FWHM of 7 nm. | The Aligner: MA6-2 has an i-line notch filter installed. This results in an exposure light peak around 365 nm with a FWHM of 7 nm. | ||
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|PEB: 60 s at 110°C | |PEB: 60 s at 110°C | ||
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