Specific Process Knowledge/Lithography/Resist/UVresist: Difference between revisions
| Line 183: | Line 183: | ||
|Long ago | |Long ago | ||
|2 µm | |2 µm | ||
| | |200 mJ/cm<sup>2</sup> | ||
|Single puddle, 60 s | |Single puddle, 60 s | ||
|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
|Long ago | |Long ago | ||
|4 µm | |4 µm | ||
| | |280 mJ/cm<sup>2</sup> | ||
|Single puddle, 60 s | |Single puddle, 60 s | ||
|rowspan="1"|PEB: 60 s at 110°C<br>Process adopted from process logs | |rowspan="1"|PEB: 60 s at 110°C<br>Process adopted from process logs | ||
| Line 238: | Line 238: | ||
|2021-06-23<br>elkh | |2021-06-23<br>elkh | ||
|1.5 µm | |1.5 µm | ||
| | |150 mJ/cm<sup>2</sup> | ||
|Single puddle, 60 s | |Single puddle, 60 s | ||
|PEB: 60 s at 110°C | |PEB: 60 s at 110°C | ||