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Specific Process Knowledge/Thermal Process/RTP Annealsys: Difference between revisions

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NLAB-Employees-701, NLAB-LabmanagerAllUsers
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Indiogo (talk | contribs)
NLAB-Employees-701, NLAB-LabmanagerAllUsers
462 edits
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|style="background:LightGrey; color:black"|Ar
|style="background:LightGrey; color:black"|Ar
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*Secondary electron (Se2)
*up to 2000 SCCM
*Inlens secondary electron (Inlens)
*High Definition four quadrant Angular Selective Backscattered electron detector (HDAsB)
*Variable pressure secondary electron (VPSE)
|-
|-
|style="background:LightGrey; color:black"|O<sub>2
|style="background:LightGrey; color:black"|O<sub>2
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*X, Y: 130 &times; 130 mm
*up to 2000 SCCM
*T: -4 to 70<sup>o</sup>
*R: 360<sup>o</sup>
*Z: 50 mm
|-
|-
|style="background:LightGrey; color:black"|NH<sub>3
|style="background:LightGrey; color:black"|NH<sub>3
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*FEG (Field Emission Gun) source
*up to 2000 SCCM
|-
|-
|style="background:LightGrey; color:black"|5% H<sub>2</sub>/Ar
|style="background:LightGrey; color:black"|5% H<sub>2</sub>/Ar
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*Fixed at High vacuum (2 &times; 10<sup>-4</sup>mbar - 10<sup>-6</sup>mbar)
*up to 2000 SCCM
*Variable at Low vacuum (0.1 mbar - 2 mbar)
|-
|-
!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Pressure
!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Pressure
|style="background:LightGrey; color:black"|Ar
|style="background:LightGrey; color:black"|Valve
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*Secondary electron (Se2)
*0 - 100
*Inlens secondary electron (Inlens)
*High Definition four quadrant Angular Selective Backscattered electron detector (HDAsB)
*Variable pressure secondary electron (VPSE)
|-
|-
|style="background:LightGrey; color:black"|O<sub>2
|style="background:LightGrey; color:black"|Controller
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*X, Y: 130 &times; 130 mm
*up to 12 mbar
*T: -4 to 70<sup>o</sup>
*R: 360<sup>o</sup>
*Z: 50 mm
|-
|-
!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates
!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates
|style="background:LightGrey; color:black"|Batch size
|style="background:LightGrey; color:black"|Batch size
|style="background:WhiteSmoke; color:black"|
*Up to 6" wafer with full view
|-
|style="background:LightGrey; color:black"|Sample size
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*Up to 6" wafer with full view
*Up to 6" wafer with full view
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