Specific Process Knowledge/Thermal Process/RTP Annealsys: Difference between revisions
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* up to 1250 C | * up to 1250 C | ||
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!style="background:silver; color:black" align="center" valign="center" rowspan="5"| | !style="background:silver; color:black" align="center" valign="center" rowspan="5"|Process gas | ||
|style="background:LightGrey; color:black"| | |style="background:LightGrey; color:black"|Ar | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*Secondary electron (Se2) | *Secondary electron (Se2) | ||
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*Variable pressure secondary electron (VPSE) | *Variable pressure secondary electron (VPSE) | ||
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|style="background:LightGrey; color:black"| | |style="background:LightGrey; color:black"|O<sub>2 | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*X, Y: 130 × 130 mm | *X, Y: 130 × 130 mm | ||
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*Z: 50 mm | *Z: 50 mm | ||
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|style="background:LightGrey; color:black"| | |style="background:LightGrey; color:black"|NH<sub>3 | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*FEG (Field Emission Gun) source | *FEG (Field Emission Gun) source | ||
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|style="background:LightGrey; color:black"| | |style="background:LightGrey; color:black"|5% H<sub>2<\sub>/Ar | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*Fixed at High vacuum (2 × 10<sup>-4</sup>mbar - 10<sup>-6</sup>mbar) | *Fixed at High vacuum (2 × 10<sup>-4</sup>mbar - 10<sup>-6</sup>mbar) | ||
*Variable at Low vacuum (0.1 mbar - 2 mbar) | *Variable at Low vacuum (0.1 mbar - 2 mbar) | ||
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!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates | !style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates | ||