Specific Process Knowledge/Thermal Process/RTP Annealsys: Difference between revisions

@@ Line 22: / Line 22: @@
 ==Samples and Process Specifications==
+The rapid thermal processor, with a base pressure of 10-6 mbar, is a research tool. As such, there are some parameters and details to consider.
+{| border="2" cellpadding="2" cellspacing="1"
+|+
+|-
+! rowspan="6" align="center"| Col1_Row1
+| rowspan="2" align="center"| Col2_Row1
+| Col3_Row1
+|-
+| Col3_Row2
+|-
+| rowspan="2" align="center"| Col2_Row2
+| Col3_Row3
+|-
+| Col3_Row4
+|-
+| rowspan="2" align="center"| Col2_Row3
+| Col3_Row5
+|-
+| Col3_Row6
+|-
+! rowspan="4" align="center"| Col1_Row2
+| rowspan="2" align="center"| Col2_Row4
+| Col3_Row7
+|-
+| Col3_Row8
+|-
+| rowspan="2" align="center"| Col2_Row5
+| Col3_Row9
+|-
+| Col3_Row10
+|}
 '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20https://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Thermal_Process/RTP_Annealsys click here]'''