Specific Process Knowledge/Thermal Process/RTP Annealsys: Difference between revisions
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''January 2023: The RTP Annealsys is being tested, but it is not released for general use yet. Please contact thinfilm@nanolab.dtu.dk for more information.'' | ''January 2023: The RTP Annealsys is being tested, but it is not released for general use yet. Please contact thinfilm@nanolab.dtu.dk for more information.'' | ||
'''RTP Annealsys (RTP AS-Premium, serial number AS0415C4 - 7484, from ANNEALSYS)''' is a research tool available at DTU Nanolab that can reach very high temperatures in a few minutes or even seconds. Therefore, it is able to perform several types of rapid thermal processing and it can be used as a multi-functional and versatile microfabrication tool, within specific process windows for each process type, using Si/nanofabricated Si structures. Currently, it is used for '''rapid thermal annealing and smoothing''' of silicon substrates. | '''RTP Annealsys (RTP AS-Premium, serial number AS0415C4 - 7484, from ANNEALSYS)''' is a research tool available at DTU Nanolab that can reach very high temperatures in a matter of a few minutes or even seconds. Therefore, it is able to perform several types of rapid thermal processing and it can be used as a multi-functional and versatile microfabrication tool, within specific process windows for each process type, using Si/nanofabricated Si structures. Currently, it is used for '''rapid thermal annealing and smoothing''' of silicon substrates. | ||
==The Set-Up== | ==The Set-Up== | ||
The chamber in RTP Annealsys possesses a top and bottom halogen lamp-configuration (16 infra-red lamps). As such, the samples are rapidly heated from both sides, simultaneously. In addition, the chamber is enclosed by two quartz-windows (immediately below/above the set of top/bottom lamps) and it is connected to two external vacuum pumps, to a gas inlet and the loadlock. Similarly, the loadlock is also connected to two external pumps. Moreover, the chamber and the loadlock are separated by the gate valve. While processing, the valve remains closed; it is only opened to exchange the substrates when both chamber and loadlock are under vacuum. The substrate transfer is possible due to the mechanical, retractable arm. | The chamber in RTP Annealsys possesses a top and bottom halogen lamp-configuration (16 infra-red lamps). As such, the samples are rapidly heated from both sides, simultaneously. In addition, the chamber is enclosed by two quartz-windows (immediately below/above the set of top/bottom lamps) and it is connected to two external vacuum pumps, to a gas inlet and the loadlock. Similarly, the loadlock is also connected to two external pumps. Moreover, the chamber and the loadlock are separated by the gate valve. While processing, the valve remains closed; it is only opened to exchange the substrates when both chamber and loadlock are under vacuum. The substrate transfer is possible due to the mechanical, retractable arm. | ||
==Temperature Measurement and Control== | |||
'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20https://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Thermal_Process/RTP_Annealsys click here]''' | '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20https://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Thermal_Process/RTP_Annealsys click here]''' | ||
Revision as of 16:00, 24 January 2023
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RTP Annealsys - Rapid Thermal Processor
January 2023: The RTP Annealsys is being tested, but it is not released for general use yet. Please contact thinfilm@nanolab.dtu.dk for more information.
RTP Annealsys (RTP AS-Premium, serial number AS0415C4 - 7484, from ANNEALSYS) is a research tool available at DTU Nanolab that can reach very high temperatures in a matter of a few minutes or even seconds. Therefore, it is able to perform several types of rapid thermal processing and it can be used as a multi-functional and versatile microfabrication tool, within specific process windows for each process type, using Si/nanofabricated Si structures. Currently, it is used for rapid thermal annealing and smoothing of silicon substrates.
The Set-Up
The chamber in RTP Annealsys possesses a top and bottom halogen lamp-configuration (16 infra-red lamps). As such, the samples are rapidly heated from both sides, simultaneously. In addition, the chamber is enclosed by two quartz-windows (immediately below/above the set of top/bottom lamps) and it is connected to two external vacuum pumps, to a gas inlet and the loadlock. Similarly, the loadlock is also connected to two external pumps. Moreover, the chamber and the loadlock are separated by the gate valve. While processing, the valve remains closed; it is only opened to exchange the substrates when both chamber and loadlock are under vacuum. The substrate transfer is possible due to the mechanical, retractable arm.
Temperature Measurement and Control
Feedback to this page: click here