Specific Process Knowledge/Thermal Process/RTP Annealsys: Difference between revisions
| Line 4: | Line 4: | ||
'''RTP Annealsys (RTP AS-Premium, serial number AS0415C4 - 7484, from ANNEALSYS)''' is a research tool available at DTU Nanolab, able to perform several types of rapid thermal processing. Currently, it is being used for '''rapid thermal annealing and smoothing''' of silicon substrates. | '''RTP Annealsys (RTP AS-Premium, serial number AS0415C4 - 7484, from ANNEALSYS)''' is a research tool available at DTU Nanolab, able to perform several types of rapid thermal processing. Currently, it is being used for '''rapid thermal annealing and smoothing''' of silicon substrates. | ||
==The Set-Up== | |||
The RTP tool is characterized by a top and bottom halogen lamp-configuration (16 lamps), as shown in Figure 1. Moreover, the tool offers an optical pyrometry system for temperature measurement, not requiring any contact with the wafer. Besides, the chamber is enclosed by two quartz-windows and it’s only connected to two external vacuum pumps, to a gas inlet and the loadlock – in front of the chamber, separated by the gate valve. While processing, the valve is closed, preventing any disturbance; it is only opened to exchange the substrates when both chamber and loadlock are under vacuum. The substrate transfer is possible due to the mechanical, retractable arm. | |||
'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20https://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Thermal_Process/RTP_Annealsys click here]''' | '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20https://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Thermal_Process/RTP_Annealsys click here]''' | ||
Revision as of 15:49, 24 January 2023
THIS PAGE IS UNDER CONSTRUCTION
RTP Annealsys - Rapid Thermal Processor
January 2023: The RTP Annealsys is being tested, but it is not released for general use yet. Please contact thinfilm@nanolab.dtu.dk for more information.
RTP Annealsys (RTP AS-Premium, serial number AS0415C4 - 7484, from ANNEALSYS) is a research tool available at DTU Nanolab, able to perform several types of rapid thermal processing. Currently, it is being used for rapid thermal annealing and smoothing of silicon substrates.
The Set-Up
The RTP tool is characterized by a top and bottom halogen lamp-configuration (16 lamps), as shown in Figure 1. Moreover, the tool offers an optical pyrometry system for temperature measurement, not requiring any contact with the wafer. Besides, the chamber is enclosed by two quartz-windows and it’s only connected to two external vacuum pumps, to a gas inlet and the loadlock – in front of the chamber, separated by the gate valve. While processing, the valve is closed, preventing any disturbance; it is only opened to exchange the substrates when both chamber and loadlock are under vacuum. The substrate transfer is possible due to the mechanical, retractable arm.
Feedback to this page: click here