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Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions

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Jehem (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, danchip
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==Exposure dose==
==Exposure dose==


[[Image:AZ spectral sensitivity.gif|400x400px|thumb|Spectral sensitivity of AZ resists represented as optical absorption.]
 


'''Data represent dose-defocus tests on Si using optical autofocus unless otherwise stated'''
'''Data represent dose-defocus tests on Si using optical autofocus unless otherwise stated'''
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