Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-2/ORE with Al2O3 mask: Difference between revisions
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|+ 1μm Pillar recipe from March 2022 - #244 = 122 min | |+ 1μm Pillar recipe from March 2022 - #244 = 122 min | ||
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! [[File:compare pillars.png|200px|thumb|'''''Pillars with different etching times.''''']] !! Time (s) !! Pressure (valve control) !! O<sub>2</sub> flow (SCCM) !! SF<sub>6</sub> flow (SCCM) !! Platen power (W) | ! [[File:compare pillars.png|200px|left|thumb|'''''Pillars with different etching times.''''']] !! Time (s) !! Pressure (valve control) !! O<sub>2</sub> flow (SCCM) !! SF<sub>6</sub> flow (SCCM) !! Platen power (W) | ||
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| '''O-step''' || 10 || 3% || 200 || 0 || 40 | | '''O-step''' || 10 || 3% || 200 || 0 || 40 | ||
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|-style="background:LightGray; color:Black" | |-style="background:LightGray; color:Black" | ||
! [[File:17.6 holes.png|200px|thumb|'''''17.6 μm holes profile.''''']] !! Time (s) !! Pressure !! O<sub>2</sub> flow (SCCM) !! SF<sub>6</sub> flow (SCCM) !! Platen power (W) !! Coil power (W) | ![[File:17.6 holes.png|200px|left|thumb|'''''17.6 μm holes profile.''''']] !! Time (s) !! Pressure !! O<sub>2</sub> flow (SCCM) !! SF<sub>6</sub> flow (SCCM) !! Platen power (W) !! Coil power (W) | ||
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| '''O-step''' || 10 || 220 mTorr || 200 || 0 || 40 || 0 | | '''O-step''' || 10 || 220 mTorr || 200 || 0 || 40 || 0 | ||