Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-2/ORE with Al2O3 mask: Difference between revisions
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|-style="background:DarkGray; color:White" | |-style="background:DarkGray; color:White" | ||
! !! Time (s) !! Pressure | ! !! Time (s) !! Pressure !! O<sub>2</sub> flow (SCCM) !! SF<sub>6</sub> flow (SCCM) !! Platen power (W) !! Coil power (W) | ||
|- | |- | ||
| '''O-step''' || | | '''O-step''' || 10 || 220 mTorr || 200 || 0 || 40 || 0 | ||
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| '''R-step''' || | | '''R-step''' || 10 || 100% || 0 || 40 || 40 || 0 | ||
|- | |- | ||
| '''E<sub>1</sub>-step''' || | | '''E<sub>1</sub>-step''' || 2 || 220 mTorr || 0 || 1200 || 0 || 0 | ||
|- | |- | ||
| '''E<sub>2</sub>-step''' || | | '''E<sub>2</sub>-step''' || 1-5 || 220 mTorr || 0 || 1200 || 1 || 2000 | ||
|} | |} | ||
