Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-2/ORE with Al2O3 mask: Difference between revisions

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=<span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>[[image:Under_construction.png|200px]]=
=<span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>[[image:Under_construction.png|200px]]=


''By Maria Farinha @nanolab, Jan 2023''
<!--''By Maria Farinha @nanolab, Jan 2023''


'''''Important!''''' The pressure settings used below '''''may no longer be permitted''''', always check with the Dry etch group.
'''''Important!''''' The pressure settings used below '''''may no longer be permitted''''', always check with the Dry etch group.
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=== Pillars ===
=== Pillars ===


[[File:compare pillars.png|600px|thumb|'''''Pillars with different etching times.''''']]
[[File:compare pillars.png|600px|left|thumb|'''''Pillars with different etching times.''''']]
{| border="1" style="text-align: center; width: 650px; height: 200px"
{| border="1" style="text-align: center; width: 650px; height: 200px"
|+ 1μm Pillar recipe from March 2022
|+ Pillar recipe: 1 μm wide, 8 μm deep, from March 2022
|-
|-
|-style="background:DarkGray; color:White"
|-style="background:DarkGray; color:White"
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| '''E<sub>2</sub>-step''' || 7 || 4% || 0 || 350 || 300
| '''E<sub>2</sub>-step''' || 7 || 4% || 0 || 350 || 300
|}
|}
 
<br clear="all" />
<br>
 


=== Holes ===
=== Holes ===


{| border="1" style="text-align: center; width: 650px; height: 200px"
{| border="1" style="text-align: center; width: 750px; height: 200px"
|+ 1μm holes recipe from March 2022
|+ Holes recipe: 1 μm wide, 17.6 μm deep holes, from March 2022
|-
|-
|-style="background:DarkGray; color:White"
|-style="background:DarkGray; color:White"
!  !! Time (s) !! Pressure (valve control) !! O<sub>2</sub> flow (SCCM) !! SF<sub>6</sub> flow (SCCM) !! Platen power (W)
!  !! Time (s) !! Pressure (valve control) !! O<sub>2</sub> flow (SCCM) !! SF<sub>6</sub> flow (SCCM) !! Platen power (W) !! Coil power (W)
|-
| '''O-step''' || 10 || 220 mTorr || 200 || 0 || 40 || 0
|-
| '''R-step''' || 10 || 100% || 0 || 100 || 40 || 0
|-
|-
| '''O-step''' || || || || ||  
| '''E<sub>1</sub>-step''' || 2 || 220 mTorr || 0 || 1200 || 0 || 0
|-
|-
| '''R-step''' || || || || ||  
| '''E<sub>2</sub>-step''' || 1-5* || 220 mTorr || 0 || 1200 || 1 || 2000
|}*Ramping during the E<sub>2</sub>-step, from 1 to 5 seconds.
 
{| border="1" style="text-align: center; width: 750px; height: 200px"
|+ Holes
|-
|-
| '''E<sub>1</sub>-step''' ||  ||  ||  ||  ||
|-style="background:DarkGray; color:White"
! Profile pictures -
|-
|-
| '''E<sub>2</sub>-step''' ||  ||  ||  ||  ||
| '''O-step'''
|}
|}


=== Nanoholes ===
=== Nanoholes ===
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| '''E<sub>2</sub>-step''' ||  ||  ||  ||  ||  
| '''E<sub>2</sub>-step''' ||  ||  ||  ||  ||  
|}
|}


=== Isotropic etch ===
=== Isotropic etch ===


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Revision as of 16:19, 18 January 2023

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